Effect of Rapid Thermal Anneling on Electrical Properties of Er/P-Inp Schottky Barrier Diode

International Journal of Electronics and Communication Engineering

© 2015 by SSRG - IJECE Journal

Volume 2 Issue 7

Year of Publication : 2015

Authors : P. Seshu Mani and Prof. P. Narasimha Reddy,

10.14445/23488549/IJECE-V2I7P113

How to Cite?

P. Seshu Mani and Prof. P. Narasimha Reddy,, "Effect of Rapid Thermal Anneling on Electrical Properties of Er/P-Inp Schottky Barrier Diode," SSRG International Journal of Electronics and Communication Engineering, vol. 2,  no. 7, pp. 34-40, 2015. Crossref, https://doi.org/10.14445/23488549/IJECE-V2I7P113

Abstract:

The temperature dependence of Current – Voltage (I-V) and Capacitance - Voltage (C-V) characteristics of Er Schottky contact on P-InP Schottky Barrier Diodes (SBD’s) have been systematically investigated in the temperature range of 180-420K in the step of 40K. The Schottky Barrier Heights (SBHs) of Er Schottky contact P-InP for as deposited sample in Current - Voltage (I-V) characteristics is 0.71 eV and in Capacitance - Voltage (C-V) characteristics is 0.96 eV. By increasing temperature from 180 - 300 K the schottky barriers height decreases and then increases by increasing the temperature in the range 340-420K.

Keywords:

Er Schottky , Annealing temperature

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